Nickel Iron Sputtering Targets

Nickel Iron Sputtering Targets

The linear formula of Nickel Iron is Ni-Fe. We produce these targets with the smallest possible average grain size and highest possible density for use in CVD, PVD, and optical applications. These thin-film sputtering targets are available as monoblock or bonded with planar target dimensions. We offer target with all shapes compatible with all standard guns including circular, "dog-bone," rotatable (rotary), annular, multi-tiled, and oval-shaped. We produced standard as well as custom sizes for commercial and research purposes. Other shapes are also available by request. Nickel Iron sputtering targets are analyzed using best-demonstrated techniques which include X-Ray Fluorescence XRF, GDMS, and Inductively Coupled Plasma (ICP). We produced these targets in standard grades when applicable, including military-grade, ACS, technical grade, pharmaceutical grade, optical grade and follows ASTM testing standards where applicable. We use ultra-high purification process to produce these targets which are ranging from 99% to 99.9999% pure.

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