Titanium Carbide Sputtering Targets

We are producing high-quality titanium carbide sputtering targets with a possibly the smallest grain size for use in CVD, PVD display and other optical applications. It has a density of 4.93 g/cm3 and its monoisotopic mass is 63.979248 Da for use in semiconductors. Titanium carbide sputtering targets have a solid appearance with a molecular weight of 59.89 g/mol. We produce these targets in many shapes like oval and angular as well as in many forms like rods, plates, and powdered forms. It has a melting point of 3160 °C and a boiling point is 4820 °C. These disks are 2 mm to 0.5 inches thick with 1 inch to 8 inches in diameter and an option of a custom target is also available. We provide these sputtering targets for commercial and research purposes and with custom compositions for the development of new proprietary technologies. It is more susceptible to breakage and more brittle. We provide pure sputtering targets to our customers.